Floating Filler (FF) in an Indium Gallium Zinc Oxide (IGZO) Channel Improves the Erase Performance of Vertical Channel NAND Flash with a Cell-on-Peri (COP) Structure

نویسندگان

چکیده

In this study, we developed a V-NAND with an improved IGZO-P type (IP) floating filler (FF) structure based on IGZO channel verified in previous studies and demonstrated that it has very fast erase speed through device simulation. The proposed FF can supply holes generated the Gate-Induced Drain Leakage (GIDL) phenomenon upper polysilicon string select line (SSL) to P-type filler, by operation shows of 4 μs. A was achieved because adjacent channel, like IP structures studies, functioned as path which electrons emitted from charge storage layer moved easily, rather than simply supplying holes. This assumption confirmed assessing change electron density during operation. Next, investigated optimum conditions for leakage current reduction various condition changes lower ground (GSL) gate structure. We be minimized changing number GSL gates, length and/or work function material. obtained 10−17 when 480 nm long six each 40 nm. gates 4.96 eV.

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ژورنال

عنوان ژورنال: Electronics

سال: 2021

ISSN: ['2079-9292']

DOI: https://doi.org/10.3390/electronics10131561